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Verfahren zur Herstellung einer UV-absorbierenden transparenten Abriebschutzschicht

Production of a UV-absorbing transparent wear protection layers comprises depositing an inorganic compounds, which form layers with a high level of abrasion resistance and a high level of UV absorption, on a substrate.
 
: Neumann, M.; Krug, M.; Schiller, N.; Kuehnel, T.

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Frontpage ()

DE 2001-10153760 A: 20011031
DE 2001-10153760 A: 20011031
WO 2002-EP11728 A: 20021019
DE 10153760 A1: 20030522
C23C0014
C23C0014
German
Patent, Electronic Publication
Fraunhofer FEP ()

Abstract
Die Erfindung betrifft ein Verfahren zur Herstellung UV-absorbierender transparenter Abriebschutzschichten durch Vakuumbeschichtung, bei dem gleichzeitig oder zeitlich unmittelbar nacheinander mindestens eine anorganische Verbindung, die Schichten mit hoher Abriebfestigkeit bildet, und eine anorganische Verbindung, die Schichten mit hoher UV-Absorption bildet, jeweils durch reaktive oder teilreaktive plasmagestuetzte Hochratebedampfung auf einem Substrat abgeschieden werden.

 

WO2003038141 A UPAB: 20030609 NOVELTY - Production of a UV-absorbing transparent wear protection layers comprises depositing an inorganic compound, which forms layers with a high level of abrasion resistance, and an inorganic compound, which forms layers with a high level of UV absorption, simultaneously or immediately in succession on a substrate by reactive or partially reactive plasma-assisted high rate vaporization. DETAILED DESCRIPTION - Preferred Features: The inorganic compound for the layers with a high level of abrasion resistance is deposited at coating rates of at least 50, preferably 100-1000 nm/s, and is made from quartz granules or aluminum oxide. The inorganic compound for the layers with a high level of UV absorption is deposited at coating rates of at least 10, preferably 20-200 nm/s, and is made from oxides or oxynitrides of Ce, Zn, Ti, V, Pb, Ni or Sn. USE - Used in the production of windows of cars and buildings. ADVANTAGE - The layers have high weathering and UV resistance.

: http://publica.fraunhofer.de/documents/PX-83516.html