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Complete X-ray lithography processing of an 8-level 0.4 micron CMOS test device

 

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Microelectronic engineering 17 (1992), No.1-4, pp.153-156
ISSN: 0167-9317
International Conference on Microlithography: Microcircuit Engineering (ME) <17, 1991, Rome>
English
Conference Paper
Fraunhofer ISIT ()
CMOS integrated circuits; X-ray lithography

Abstract
Sub-0.5 mu m CMOS devices have been successfully fabricated by means of X-ray lithography at all levels. The overlay of subsequent lithography levels was determined to be