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Title
Siliciumborcarbonitridkeramiken und Vorlaeuferverbindungen, Verfahren zu deren Herstellung und Verwendung
Date Issued
2005
Author(s)
Jansen, M.
Mueller, U.
Clade, J.
Sporn, D.
Patent No
2000-10045427
Abstract
Die vorliegende Erfindung betrifft neue Alkylhalogensilylaminoborane, insbesondere Alkylchlorsilylaminoborane, die durch die Variation der Anzahl der reaktiven Zentren die Viskositaetseinstellung von Polyborosilazanverbindungen ermoeglichen, neue Borosilazanverbindungen, neue Oligo- oder Polyborosilazanverbindungen, die das Strukturmerkmal R1-Si-NH-B-R2 aufweisen, wobei R1 oder R2 oder beide einen Kohlenwasserstoffrest mit 1 bis 20 C-Atomen, insbesondere Alkyl-, Phenyl- oder Vinylgruppen darstellen, Siliciumborcarbonitridkeramikpulver, keramisches Material auf der Basis SiC, SiN und BN, sowie Verfahren zur jeweiligen Herstellung und die Verwendung der Polyborosilazane und der keramischen Materialien.
WO 200222624 A UPAB: 20020820 NOVELTY - New borosilane compounds (1) are claimed. DETAILED DESCRIPTION - New borosilane compounds of formula (1) are claimed. RxHal3-xSi-NH-BRyHal2-y (1) R = 1-20C hydrocarbon; Hal = Cl, Br or I; x = 1 or 2; y = 0 or 1. INDEPENDENT CLAIMS are also included for the following: (i) A process for the production of a compound of formula (1) by reaction of a compound of formula (2) with a compound of formula (3) at -100 deg. C to +25 deg. C. (ii) A process for the production of a compound of formula (2) by reaction of a compound of formula (4) with a compound of formula (5). (iii) Borosilazane compounds of formula (6). (iv) A process for the production of the borosilazane compound of formula (6) by reaction of a compound of formula (1) with at least a 4-8 fold molar quantity of a compound of formula (7) at -80 to +300 deg. C. (v) Oligo- or polyborosilazane compounds prepared by reaction of a compound of formula (1) and/or a compound of formula (6) with a compound of formula (7) or by polymerization of a compound of formula (1) or formula (4) so that it contains the structural groups C-Si-N-B, Si-N-B-C and/or C-Si-N-B-C. (vi) A process for the production of a siliconboroncarbonitride ceramic by heat treatment of a borosilazane compound of formula (6) or an oligo- or polyborosilazane compound in an inert or an amine and/or NH3-containing atmosphere at 800-1700 deg. C. (vii) The resulting silicon boroncarbonitride ceramic containing C-Si-N-B, Si-N-B-C and/or C-Si-N-B-C structural units and greater than 93 wt.% Si, N, B and C. (viii) A process for the production of a composite ceramic of SiC, Si3N4 and BN by heating a siliconboroncarbonitride ceramic at above 1700 deg. C. (ix) The resulting composite ceramic prepared by crystallization of a silicon boroncarbonitride ceramic containing molecularly dispersed SiC, Si3N4 and BN. (x) Ceramic fibers prepared by melt spinning a polyborosilazane compound under an inert atmosphere, treating the spun green fibers, optionally in a separate process step with a reactive gas, preferably NH3, ethylene diamine, trichlorosilane, dichlorosilane, borane-dimethylsulfide adduct, borane-triethylamine adduct, B2H6 or with electromagnetic radiation or particle beam irradiation to render them unmeltable and heating the hardened green fibers at 800-1600 deg. C, preferably 1200 deg. C. RxHal3-xSi-NH-SiR3 (2) BRyHal3-y (3) RxSiHal4-x (4) R3Si-NH-SIR3 (5) (R'R''N)qRxHal3-x-qSi-NH-BRyHal2-y-z(NR'R'')z (6) R'R''NH (7) R', R'' = H or 1-20C hydrocarbon; q = 0-2; z = 0-2; q+z at least 1; x+q at most 3; y+z at most 2. USE - The borosilazane or the oligo- or polyborosilazane compound is useful for the production of ceramic fibers, ceramic coatings, molded articles, film and/or ceramic microstructures by injection molding or lithographic processes. The ceramic fibers are useful for the preparation of textiles or netting. The borosilazane compound is useful in chemical vapor deposition or physical vapor deposition processes (claimed). ADVANTAGE - The borosilane compounds (1) have improved viscosity and allow the preparation of ceramics with a high carbon content.
Language
de
Patenprio
DE 2000-10045427 A: 20000914