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Characterization of silicon open stencil masks in an ion projection lithography machine

 
: Mescheder, U.; Buchmann, L.-M.; Torkler, M.

Microelectronic engineering 13 (1991), No.1-4, pp.353-356
ISSN: 0167-9317
International Conference on Microlithography: Microcircuit Engineering (ME) <16, 1990, Leuven>
English
Conference Paper
Fraunhofer ISIT ()

: http://publica.fraunhofer.de/documents/PX-7545.html