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Characterization of oxide etching and wafer cleaning using vapor-phase anhydrous HF and ozone

 

Riley, T.J.; Gelpey, J.C.; Roozeboom, F.; Saito, S.:
Rapid thermal and integrated processing VI
Pittsburgh: MRS, 1997 (Materials Research Society symposia proceedings 470)
ISBN: 1-55899-374-6
Materials Research Society (Symposium) <1997, San Francisco/Calif.>
English
Conference Paper
Fraunhofer IIS B ( IISB) ()

: http://publica.fraunhofer.de/documents/PX-7533.html