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Characterization of oxide etching and wafer cleaning using vapor-phase anhydrous HF and ozone
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1997
Conference Paper
Titel
Characterization of oxide etching and wafer cleaning using vapor-phase anhydrous HF and ozone
Author(s)
Froeschle, B.
Deutschmann, L.
Bauer, A.J.
Burte, E.P.
Hauptwerk
Rapid thermal and integrated processing VI
Konferenz
Materials Research Society (Symposium) 1997
Language
English
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