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  4. Characterization of metal impurities in silicon-on-insulator material
 
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1992
Journal Article
Title

Characterization of metal impurities in silicon-on-insulator material

Abstract
Metal impurities in silicon-on-insulator material were characterized by total-reflection X-ray fluorescence spectroscopy (TXRFS). Wafers from different suppliers were analyzed. Surface concentrations of metallic impurities of the order of 10high11 qcm were found. Wafers representing single stages of the separation by implanted oxygen (SIMOX) fabrication were characterized. TXRFS data were compared with atomic absorption spectroscopy and secondary ion mass spectroscopy results.
Author(s)
Frey, L.
Kroninger, F.
Streckfuß, N.
Ryssel, H.
Journal
Materials Science and Engineering  
Conference
Ion Beam Synthesis of Compound and Elemental Layers 1991  
Language
English
IIS-B  
Keyword(s)
  • contamination analysis

  • semiconductor processing

  • silicon on insulator

  • surface analysis

  • total reflection

  • x-ray fluorescence

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