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Characterization and applications of PLD oxide ceramic films


Mordike, B.L. ; Wissenschaftlicher Arbeitskreis Laser-Technik; Deutsche Gesellschaft für Materialkunde e.V. -DGM-, Oberursel; Deutscher Verband für Schweißtechnik e.V. -DVS-, Düsseldorf; Arbeitsgemeinschaft Wärmebehandlung und Werkstofftechnik e.V. -AWT-:
Laser treatment of materials. Papers presented at the European Conference on Laser Treatment of Materials 1992
Oberursel: DGM-Informationsgesellschaft, 1992
ISBN: 3-88355-185-6
pp.539-544 : Abb.,Tab.,Lit.
European Conference on Laser Treatment of Materials (ECLAT) <4, 1992, Göttingen>
Conference Paper
Fraunhofer ILT ()
beam geometry; energy coupling; plasma; pulse laser deposition; semiconductor oxide; vacuum chamber

The pulse laser deposition (PLD) exhibits various consecutive processes (1,2) separated in space and time such as the energy coupling into the target material, the removal of the material from the target, the transfer of the target material as vapour and/or plasma to the substrate via the gas phase and the growth of thin films onto the substrate. The properties of the deposited films strongly depend on their growth conditions, which are highly influenced by the surface temperature and the mobility of the particles at the surface either of the substrate or of the films deposited.