Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Broadband antireflection coatings deposited with ion-assisted evaporation
| Amra, C. ; European Optical Society -EOS-; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical Interference Coatings : 25 - 27 May 1999, Berlin, Germany
Bellingham, Wash.: SPIE, 1999 (Europto series)
ISBN: 0-8194-3212-1
pp.76-87 |
| Conference on Advances in Optical Coatings <1999, Berlin> |
|
| English |
| Conference Paper |
| Fraunhofer IOF () |
| antireflective coatings; ion-assisted deposition; scratch resistance |
Abstract
SiO2, Ta2O5 and MgF2 have been deposited by electron beam evaporation under bombardment of ions generated by three different ion or plasma sources. Multilayer systems containing 5 to 12 layers have been designed and realized. The maximum reflectance R of a glass/air interface can be reduced down to R < 0.5 percent in a spectral region of 400 nm to 700 nm with each of such AR coatings mostly exceeds that of all-oxide system in the shorter wavelength region. With scanning scratch test the scratch resistance of the coatings have been determined relative to each other.