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Bindungsstruktur in plasmapolymerisierten Schichten aus Vinyltrimethylsilan


Berichte der Bunsengesellschaft für Physikalische Chemie 95 (1991), No.11, pp.1376
ISSN: 0005-9021
Journal Article
Fraunhofer IFAM ()
chemical bond; ESCA; infrared; PECVD; photoelectron; plasmapolymerisation; polymer; spectroscopy; vinyltrimethylsilane

Plasma polymer films of vinyltrimethylsilane (VTMS) were deposited by radiofrequency (RF, 13.56 MHz) or Microwave (MW, 2.45 GHz) discharges in two reactors of the same volume and geometry. - The polymer films were characterized by electron spectroscopy for chemical analysis (ESCA) and infrared spectroscopy (FTIR). It turned out, that the RF - and the MW - polymers had almost the same Si/C-composition ratio of 1/5 in the entire range of RF- and MW-power (60 - 150 W). Although the Si/C film-composition remains almost constant, the binding states of Si- and C-atoms in the respective ESCAspectra are changing. While the C-Si part of the Cls-peak increases with the RF- or MW- power, the C-H/C-C part of the peak decreases, indicating a loss of hydrogen in the polymer films. - Obviously the fragmentation of the VTMS-monomer is quite different for the two types of plasma discharges. While films of the RF-plasma clearly show strong contributions of the methyl and vinyl groups, these groups are c ompletely missing for the MW-plasma polymers. - From these results structure models of the plasma polymers have been developed.