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Herstellungsverfahren fuer einen elektrischen Isolator

Making insulators of any size, micro to megavolt, involves coating non-specific former with plasma polymer under defined conditions of power density, gas flow and unusual level of vacuum.
 
: Liebermann, J.; Baalmann, A.; Vissing, K.D.; Hennemann, O.

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Frontpage ()

DE 1998-19835883 A: 19980807
DE 1998-19835883 A: 19980807
WO 1999-DE2302 A: 19990727
DE 19835883 A1: 20000217
H01B0019
H01B0019
German
Patent, Electronic Publication
Fraunhofer IFAM ()

Abstract
Es wird ein Herstellungsverfahren fuer einen elektrischen Isolator angegeben, wobei auf ein Formstueck des Isolators eine hydrophobe plasmapolymere Belegung aufgebracht wird. Die plasmapolymere Belegung wird dabei durch Zuenden eines Plasmas in einem unpolaren oder unpolare Gruppen aufweisenden Arbeitsgas bei einem Arbeitsdruck zwischen 1 .times. 10-5 mbar und 5 .times. 10-1 mbar hergestellt. Der elektrische Leistungseintrag pro Kammervolumen liegt zwischen 0,5 und 5 kW/m3, der Gasfluss pro Kammervolumen liegt zwischen 10 und 1000 sccm/m3. Es wird eine dauerhafte, harte und hydrophobe plasmapolymere Belegung geschaffen, deren Qualitaet von dem Material des Formstuecks unabhaengig ist.

 

DE 19835883 A UPAB: 20000419 NOVELTY - The former is placed into the evacuated plasma reactor chamber. A process gas with unipolar groups is introduced continuously holding the chamber pressure at a predetermined value. Plasma is generated by an electrical field, maintained until a closed layer of plasma polymer covers the former. DETAILED DESCRIPTION - The former is placed into the plasma reactor (1) chamber (2). A process gas with unipolar groups is introduced continuously, holding chamber pressure at 1 x 10-5 - 5 x 10-1. Plasma is generated by an electrical field, introducing 0.5 kW/m3 - 5 kW/m3 of electrical power. Gas flow is adjusted to 10 sccm/m3 - 1000 sccm/m3. Plasma is maintained until a closed layer of plasma polymer covers the former. Preferred features: Power density is 1kW/m3 - 3.5 kW/m3. Gas flow density is 20 sccm/m3 - 300 sccm/m3. Plasma is maintained to produce plasma polymer layer 100 nm - 10 mu m thick. During evacuation, oxidant gas, especially air is introduced, maintaining pressure at 1 -5 mbar and exciting a cleaning plasma for 1 sec - 5 min. The plasma is excited cyclically at 0.1 - 100 Hz, using electrodes in the chamber. The field alternates at 1 kHz - 5 GHz. Working pressure is 1 x 10-3 - 1 x 10-1 mbar. USE - The insulator is for high voltage, especially a long rod insulator (specified in claims). Cited in the text are insulators for microelectronics. Given apparatus and power, size is unimportant. ADVANTAGE - A hydrophobic plasma polymer coating is applied to the insulator former. Coating is independent of former material. An impressive size range is offered, from electronic micro components, to high voltage insulators, meters long. The coating is hard and durable. It is firmly bonded to the substrate. Unusually high chamber pressure is used, but in combination with the cited conditions, even, durable deposition is achieved. The former material, has little influence on quality of results. Surprise is registered.

: http://publica.fraunhofer.de/documents/PX-63429.html