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1990
Conference Paper
Titel
Assessment of high contrast g- and i-line resists using high numerical aperture exposure tools
Abstract
Tests of several high contrast g- and i-line resists furnish data with respect to the resolution limit, focus and exposure latitudes, thermal stability and Dill parameters. A g-line stepper of NA = 0.48 and an i-line stepper of NA = 0.40 were primarily used for exposure, to a minor extent a g-line stepper of NA = 0.55. The contributions to the focus budget available under production conditions are discussed. SAMPLE simulations extending NA to 0.60 in the g-line and 0.50 in the i-line case give latitude trends to be expected in the near future.