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Application of SiC-X-ray masks for fabrication submicron devices
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1988
Conference Paper
Titel
Application of SiC-X-ray masks for fabrication submicron devices
Author(s)
Mackens, U.
Lüthje, H.
Mescheder, U.
Mund, F.
Pongratz, S.
Hauptwerk
Optical/laser microlithography
Konferenz
Symposium on Microlithography 1988
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT