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Anwendung eines Verfahrens zum Messen einer die Kapazitaets-Spannungs-Charakteristik eines kapazitiven Halbleiter-Elementes beeinflussenden Groesse

Application of a process for the measurement of a parameter influencing the capacitance-voltage characteristic of a capacitive semiconductor component
 
: Schoeneberg, U.; Hosticka, B.; Maclay, J.; Zimmer, G.

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Frontpage ()

DE 1990-4014395 A: 19900504
DE 1990-4014395 A: 19900504
DE 4014395 C2: 19920402
G01R0027
German
Patent, Electronic Publication
Fraunhofer IMS ()

Abstract
According to the German patent application, the measurement accuracy and the signal-noise ratio is improved in a circuit and a process for the measurement of a parameter affecting the capacitance-voltage characteristic of a capacitive component so that the parameter is determined from the area below the curve of the capacitance-voltage characteristic, whereby, according to the invention of this additional report, the circuit and the process is used for the measurement of ion concentrations in liquids.

: http://publica.fraunhofer.de/documents/PX-4203.html