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Wettability, chemical and morphological data of hydrophobic layers by plasma polymerization on smooth substrates

: Elkin, B.; Mayer, J.; Schindler, B.; Vohrer, U.


Surface and coatings technology 116-119 (1999), pp.836-840 : Ill., Lit.
ISSN: 0257-8972
Journal Article
Fraunhofer IGB ()
hydrophobic layer; plasma polymerization; wettability

Plasma polymer layers were deposited from perfluoropropene plasma on rough and polished silicon wafers. Deposition was performed in a novel plasma apparatus using a special electrode arrangement for high lateral homogeneity of the deposits. The deposition parameters were optimized to develop highly hydrophobic layers with good de-wetting properties and adherence. The best results could be achieved by using a pulse plasma with on/off ratios of 1/5 ms. The water contact angle under receding conditions could be enhanced up to 97 degree.