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Vorrichtung zur Messung von Plasmaparametern in Hochfrequenzentladungen

Device for the measurement of plasma parameters in high-frequency discharges
 
: Baenziger, U.; Neumann, G.

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Frontpage ()

DE 1992-4200636 A: 19920113
DE 1992-4200636 A: 19920113
DE 4200636 A1: 19930715
G01R0029
German
Patent, Electronic Publication
Fraunhofer ISIT ()

Abstract
The description refers to a device for the measurement of plasma parameters in high-frequency discharges comprising a Langmuir plasma probe. In order to use such a probe which is used for measurements in direct-current discharges, for measurements in high-frequency discharges the modulation of the probe current must be compensated or suppressed. If it is compensated, sensitive adjustment procedures must be performed and the compensation must be readjusted if the plasma parameters vary. Known suppression methods depend on a modification of the Langmuir probe used. In the invention, the probe supply lead is used as a component of the high-frequency suppression circuit. This makes it possible to locate the other elements of the circuit at a great distance from the probe tip outside the plasma reactor. The device is simple to adjust to any Langmuir probe.

: http://publica.fraunhofer.de/documents/PX-40937.html