Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Vorrichtung und Verfahren zur gezielten Probenbearbeitung, vorzugsweise von Halbleiterbauelementen, mittels einer Ionen-Feinstrahlanlage

Selective specimen processing device, mainly for semiconductor components - generates sound waves in specimen detected by sensor evaluated for spatial coordination between beam and specimen.
: Koehler, B.; Bischoff, L.; Teichert, J.

Frontpage ()

DE 1996-19606478 A: 19960221
DE 1996-19606478 A: 19960221
DE 19606478 A1: 19970828
Patent, Electronic Publication
Fraunhofer IZFP ()

The appliance has anion beam source (Q) to generate a ion beam focussed on a surface of the specimen (T). The beam (2) generates sound waves in the specimen which are detected by a sensor (AS) located on the specimen which feeds signals to an evaluator for providing spatial coordination between beam and specimen. The evaluator can be suitable for generation of an image to provide a visual representation of the specimen surface or a cross-section of its profile. The beam can be pulsed and have a diameter of approximately 100 nm whilst the sensor can be a piezo-electric sensor with an integrated pre-amplifier. USE/ADVANTAGE - In microelectronic and micro system applications. Enables hidden structures to be formed and provides for visual monitoring of actual position of beam and specimen surface.