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  4. Annealing of boron-implanted silicon using a CW CO2-laser.
 
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1981
Journal Article
Title

Annealing of boron-implanted silicon using a CW CO2-laser.

Other Title
Ausheilung von Bor implantiertem Silizium mittels eines CW CO2 Lasers
Author(s)
Tsien, P.H.
Tsou, S.C.
Takai, M.
Roeschenthaler, D.
Ramin, M.
Ryssel, H.
Ruge, I.
Wittmaack, K.
Journal
Physica status solidi. A  
Language
English
IFT  
Keyword(s)
  • annealing

  • Bor

  • implantation

  • laser

  • Rekristallisation

  • Silizium

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