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Annealing of boron-implanted silicon using a CW CO2-laser.
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1981
Journal Article
Title
Annealing of boron-implanted silicon using a CW CO2-laser.
Other Title
Ausheilung von Bor implantiertem Silizium mittels eines CW CO2 Lasers
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Author(s)
Tsien, P.H.
Tsou, S.C.
Takai, M.
Roeschenthaler, D.
Ramin, M.
Ryssel, H.
Ruge, I.
Wittmaack, K.
Journal
Physica status solidi. A
Language
English
IFT
Keyword(s)
annealing
Bor
implantation
laser
Rekristallisation
Silizium