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Vertically integrated circuits. A key technology for future high performance systems

 

Societe Francaise du Vide -SFV-, Paris:
CIP '97. 11th International Colloquium on Plasma Processes. Proceedings
Paris: SFV, 1997 (Le vide 284)
pp.187
International Colloquium on Plasma Processes (CIP) <11, 1997, Le Mans>
English
Conference Paper
Fraunhofer IFT; 2000 dem IZM eingegliedert

: http://publica.fraunhofer.de/documents/PX-39963.html