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Verfahren zur Herstellung waermereflektierender Schichtsysteme

Heat reflecting layer system production on transparent substrate e.g. glass - by sputtering using plasma to give individual layers consisting of dielectric and metallic layers.
 

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Frontpage ()

DE 1996-19640832 A: 19961002
DE 1996-19640832 A: 19961002
EP 1997-116713 A: 19970925
DE 19640832 C2: 20000810
EP 834482 B1: 20011219
C03C0017
C23C0014
C23C0014
German
Patent, Electronic Publication
Fraunhofer FEP ()

Abstract
Production of a heat reflecting layer system on a transparent substrate by sputtering where individual layers consist of dielectric and metallic layers is claimed. After sputtering at least one layer, an additional plasma is effective on the layer. USE - Used in the production of a layer system on flat glass. ADVANTAGE - Emission is reduced by maintaining or raising the transmission in the visible region.

: http://publica.fraunhofer.de/documents/PX-39374.html