Verfahren zur Herstellung waermereflektierender Schichtsysteme
Date Issued
2001
Author(s)
Kirchhoff, V.
Schneider, S.
Hartung, U.
Soeder, B.
Meier, A.
Patent No
1996-19640832
Abstract
Production of a heat reflecting layer system on a transparent substrate by sputtering where individual layers consist of dielectric and metallic layers is claimed. After sputtering at least one layer, an additional plasma is effective on the layer. USE - Used in the production of a layer system on flat glass. ADVANTAGE - Emission is reduced by maintaining or raising the transmission in the visible region.