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Verfahren zur Herstellung von duennen Schichten aus Hafniumdioxid

Process for the production of thin films made of hafnium(IV) oxide
: Uhlig, H.; Kaiser, U.; Vogel, S.

Frontpage ()

DE 1992-4231778 A: 19920923
DE 1992-4231778 A: 19920923
DE 4231778 C1: 19930527
Patent, Electronic Publication
Fraunhofer IOF ()

The invention relates to a process for the production of thin films made of hafnium (IV) oxide, in particular for an optical interference coating system by reactive vapour deposition on a sibstrate on a vacuum in a vacuum chamber. The invention is based on the task that the least technically possible quantity of water vapour is permitted to be vapour-deposited in the vacuum chamber at a reactive gas pressure of less than 0.02 Pa, that the substrate temperature is maintainted at greater than 200 Celsius during vapour deposition and that the vapour deposition rate is maintained at smaller than 0.3 nm s->-1.