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  4. Verfahren zur Herstellung eines fotoelektronischen Mikrochips, der eine lichtundurchlaessige Schicht aufweist
 
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Patent
Title

Verfahren zur Herstellung eines fotoelektronischen Mikrochips, der eine lichtundurchlaessige Schicht aufweist

Other Title
Microchip manufacturing method for photoelectronic microchip with opaque film - applying ink, indian ink, lacquer or coloured adhesive using modified ink-jet method whereby droplets are sprayed on contactlessly in drop-on-demand mode.
Abstract
The method involves using an ink, an indian ink, a lacquer or a coloured or blackened adhesive as the opaque film (5). This is applied using a modified ink-jet method whereby droplets are sprayed on contactlessly. The covering film can be applied in drop-on-demand mode. The movement of the ink-jet spray head (6) relative to the microchip is controlled using data directly derived from the layout of the microchip. USE - E.g. for chips with photoelectric functions and other regions with structures sensitive to light. ADVANTAGE - Enables opaque film to be applied at low cost and with little labour.
Inventor(s)
Guyenot, V.
Risse, S.
Lude, C.
Link to Espacenet
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=DE&NR=19654828A
Patent Number
1996-19654828
Publication Date
1998
Language
German
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF  
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