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Verfahren zur Beschichtung von sub-Mikrometerstrukturen und seine Anwendung

Method of coating submicrometer structures for highly integrated circuits - by vapour coating using a transport inert gas..
 
: Weber, A.; Jung, T.

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Frontpage ()

DE 1995-19513918 A: 19950412
DE 1995-19513918 A: 19950412
DE 19513918 C1: 19961107
C23C0014
German
Patent, Electronic Publication
Fraunhofer IST ()

Abstract
Submicrometer structures are coated by cathodic sputtering or vaporising a target material in a high or low vacuum chamber with a carrier inert gas going past the target, collecting the vapour material and transporting it perpendicularly onto the surface to be coated. USE - Coating highly integrated circuits. ADVANTAGE - The bottom and sides of small surface depressions are coated at high speed without the depressions becoming fully filled in.

: http://publica.fraunhofer.de/documents/PX-39034.html