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Verfahren und Vorrichtung zur plasmachemischen Reinigung von Substraten

Process and device for the plasma-chemical cleaning of substrates
 
: Gunsilius, H.; Oehr, C.

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Frontpage ()

DE 1994-4414263 A: 19940423
DE 1994-4414263 A: 19940423
DE 4414263 C2: 20000706
B08B0007
German
Patent, Electronic Publication
Fraunhofer IGB ()

Abstract
The invention relates to a device and a process for the plasma-chemical cleaning of substrates by means of a low-temperature low-pressure plasma, by which water or an aqueous gas mixture is used as the plasma gas. This permits the removal of the various impurities from a wide variety of substrate materials. For example, metals, semiconductor products, organic and unorganic polymers and non-metallic unorganic materials can be cleaned. Moreover, impurities such as oils, greases, plastic residue, burnt-in, resinified oils, oxides, grinding and polishing agents can be removed.

: http://publica.fraunhofer.de/documents/PX-38713.html