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Verfahren und Vorrichtung zur Erzeugung hochangeregter Plasmen mittels gepulster Funkenentladung

Generation of a high power plasma for production of thin dielectric layers - has a tube of silicon dioxide with cathode and anode system within oxygen atmosphere with controlled pressure.
 
: Schultrich, B.; Lenk, A.; Witke, T.

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Frontpage ()

DE 1996-19629054 A1: 19960718
DE 1997-19727882 A: 19970630
DE 19727882 A1: 19980129
H05H0001
German
Patent, Electronic Publication
Fraunhofer IWS ()

Abstract
The device has a dielectric tube of silicon dioxide with a wall thickness of 2 mm, a length of 7 cm and an inner diameter of 7 mm. Into one end is set a cathode [1] that is made of metal, semiconductor material or carbon. An anode [3] is set at the other end and the separating distance is 8 cm. The anode may also be fabricated from metal, semiconductor material or carbon. A capacitor is discharged to trigger the plasma in the tube. The anode side is within an oxygen filled space that contains a substrate of silicon [6] and an extraction grating [5]. The dielectric material may be aluminium oxide. USE - For production of thin dielectric sheets such as ceramic materials. ADVANTAGE - Ensures pulsed discharge on dispensing target.

: http://publica.fraunhofer.de/documents/PX-38651.html