Generation of a high power plasma for production of thin dielectric layers - has a tube of silicon dioxide with cathode and anode system within oxygen atmosphere with controlled pressure.

: Schultrich, B.; Lenk, A.; Witke, T.

Abstract
The device has a dielectric tube of silicon dioxide with a wall thickness of 2 mm, a length of 7 cm and an inner diameter of 7 mm. Into one end is set a cathode [1] that is made of metal, semiconductor material or carbon. An anode [3] is set at the other end and the separating distance is 8 cm. The anode may also be fabricated from metal, semiconductor material or carbon. A capacitor is discharged to trigger the plasma in the tube. The anode side is within an oxygen filled space that contains a substrate of silicon [6] and an extraction grating [5]. The dielectric material may be aluminium oxide. USE - For production of thin dielectric sheets such as ceramic materials. ADVANTAGE - Ensures pulsed discharge on dispensing target.