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  4. Verfahren und Vorrichtung zur Erzeugung hochangeregter Plasmen mittels Funkenentladung fuer die Abscheidung duenner Schichten
 
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Patent
Title

Verfahren und Vorrichtung zur Erzeugung hochangeregter Plasmen mittels Funkenentladung fuer die Abscheidung duenner Schichten

Other Title
Pulsed high power plasma generation device for cleaning thin dielectric substrates - has tube of SiO2 with cathode and anode system producing fully ionised hot gas plasma oxygen, with gas pressure control.
Abstract
The device has a dielectric tube of SiO2 with a wall thickness of 2 mm, a length of 7 cm and an inner diameter of 7 mm. Into one end is set a cathode [1] part, that is fabricated from metal, semiconductor material or carbon. An anode [3] is located at the other end, and the separating distance is 8 cm. The anode may also be made from metal, semiconductor material or carbon. A capacitor discharge is used to trigger the plasma in the tube. The anode is located in an argon gas filled space. The arc discharge in the tube produces a plasma that flows from the anode side. USE - For processing of thin dielectric sheets, such as ceramic materials ADVANTAGE - Ensures pulsed discharge onto dispensing target.
Inventor(s)
Schultrich, B.
Lenk, A.
Witke, T.
Link to Espacenet
http://worldwide.espacenet.com/publicationDetails/biblio?DB=worldwide.espacenet.com&locale=en_EP&FT=D&CC=DE&NR=19727883A
Patent Number
1996-19629054
Publication Date
1998
Language
German
Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS  
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