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Title
Verfahren und Vorrichtung zum Auftragen von Fotoresistlack auf nicht ebene Grundkoerperoberflaechen
Date Issued
2000
Author(s)
Luethje, H.
Daaud, S.
Boettcher, R.
Patent No
1996-19633407
Abstract
An apparatus for photoresist application onto non-flat substrate surfaces for photolithographic processes includes a resist feed system (1) mounted on an x-y-z guide (5) and consisting of one or more capillary systems (3). The or each capillary system (3) is directly connected to a resist supply chamber (2) and has defined tip geometries (4) or nozzles (4') providing an adjustable application force or having a fixed distance from the substrate surface for applying photoresist in the form of one or more contact spots or individual droplets of defined shape onto the substrate (10) surface. Also claimed is a process for photoresist coating of a non-flat substrate surface by controlled spot transfer of resist onto the surface. USE - For producing a resist pattern useful as a mask for various thin film processes, e.g. for producing sensors. ADVANTAGE - The apparatus permits controlled photoresist coating of non-flat or rotationally symmetrical surfaces with much reduced photoresist consumpt ion and in a selective manner without contact of adjacent regions with the photoresist.
Language
de
Patenprio
DE 1996-19633407 A: 19960819