Process and device for process stabilization during electron beam vapour deposition

: Kirchhoff, V.; Metzner, C.; Goedicke, K.; Schiller, S.; Kern, H.

Abstract
The invention stabilizes the process of electron beam vapour deposition in such a way that local homogeneous layers of constant properties, in particular in long-term operation, are produced. According to the invention, the intensity of at least one spectral line and, if necessary, of radiation emitted by the reactive gas are detected at at least two places in the vapour diffusion chamber and in at least one area of the surface of the vaporization substance. The signal gained is further processed for controlling the parameters of the electron gun. The process is preferably used for the surface treatment of semi-finished and finished products, e.g. in metallurgy, mechanical engineering, optics, the packing industry and the glass industry.