Patent
Title

Verfahren und Anordnung zur Plasma-Erzeugung

Other Title
Process and arrangement for generating plasma
Abstract
Plasma is generated by applying a voltage to points at a distance from each other on a microporous body. This can take place, for example, by applying a voltage between 50 V and 100 V across a microporous laser of a silicon wafer
Inventor(s)
Kozlowski, F.
Steiner, P.
Lang, W.
Sauter, M.
Richter, A.
Link to:
Patent Number
1993-4304846
Publication Date
1996
Language
German