
Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Verfahren und Anordnung zur Plasma-Erzeugung
Process and arrangement for generating plasma
| DE 1993-4304846 A: 19930217 |
| DE 1993-4304846 A: 19930217 EP 1994-907553 A: 19940211 WO 1994-EP400 W: 19940211 |
| DE 4304846 A1: 19940818 EP 685117 A: 19951206 |
| H01L0033 |
|
| German |
| Patent, Electronic Publication |
| Fraunhofer IZM () |
Abstract
Plasma is generated by applying a voltage to points at a distance from each other on a microporous body. This can take place, for example, by applying a voltage between 50 V and 100 V across a microporous laser of a silicon wafer