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Three-dimensional simulation of ion-enhanced dry-etch processes
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1991
Journal Article
Titel
Three-dimensional simulation of ion-enhanced dry-etch processes
Author(s)
Pelka, J.
Zeitschrift
Microelectronic engineering
Konferenz
International Conference on Microlithography: Microcircuit Engineering (ME) 1990
DOI
10.1016/0167-9317(91)90012-3
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT