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Thermally activated dopant diffusion in crystalline silicon at 200 degree C.

Thermisch aktivierte Dopandendiffusion in kristallinem Silicium bei 200 Grad C
 
: Pichler, P.; Orlowski, M.

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Fulltext urn:nbn:de:0011-px-363772 (296 KByte PDF)
MD5 Fingerprint: 4d26341ecd57af58344974b26b622232
Copyright AIP
Created on: 7.2.2015


Applied Physics Letters 60 (1992), No.10, pp.1205-1207
ISSN: 0003-6951
ISSN: 1077-3118
English
Journal Article, Electronic Publication
Fraunhofer IIS B ( IISB) ()
Antimon; diffusion; Silicidierung

Abstract
Recently, anomalous, asymmetric diffusion of dopants in silicon during silicidation at temperatures as low as 200degreeC has been reported. This observation has not been explained satisfactorily so far and presents, therefore, a formidable challenge to present Fickian-type diffusion theories. In this letter, the structure of the asymmetric diffusion is analyzed and it is shown that the anomalous diffusion can be explained consistently by postulating the existence of an inhomogeneous stress field as an external driving force in conjunction with stress relaxation mechanisms due to the silicon self-interstitial diffusion. However, at the same time, it is demonstrated conclusively that the hypothesized diffusion in stress fields cannot be effectuated by thermal activation.

: http://publica.fraunhofer.de/documents/PX-36377.html