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  4. AlGaInP/GaInAs/GaAs MODFET devices - candidates for optoelectronic integrated circuits
 
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1993
Journal Article
Title

AlGaInP/GaInAs/GaAs MODFET devices - candidates for optoelectronic integrated circuits

Other Title
AlGaInP/GaInAs/GaAs MODFET-Bauelemente - Kandidaten für optoelektronisch integrierte Schaltkreise
Abstract
Modulation doped field effect transistors (MODFETs) with a phigh+-GaAs gate structure were fabricated from AlGaInP/GaInAs/GaAs heterostructures for the first time. Self-aligned devices with a gate length of 0.7 mym exhibit drain currents of 330 mA mmhigh-1, transconductances of 200 mS mmhigh-1 and very small gate currents below 50 nA even at gate-source voltages of - 5 V. Furthermore, large gate-drain diode breakdown voltages in excess of 30 V are observed. Short gatelength devices (0.3 mym) show a good r.f. performance with a current gain cut-off frequency of 60 GHz and a maximum frequency of oscillation of 140 GHz.
Author(s)
Pletschen, Wilfried  
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Bachem, K.H.
Tasker, P.J.
Winkler, K.
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Journal
Materials Science and Engineering, B. Solid state materials for advanced technology  
DOI
10.1016/0921-5107(93)90373-U
Language
English
Fraunhofer-Institut für Angewandte Festkörperphysik IAF  
Keyword(s)
  • AlGaInP/GaInAs/GaAs heterostructure

  • AlGaInP/GaInAs/GaAs Heterostruktur

  • carbon doping

  • chemical vapour deposition

  • Kohlenstoffdotierung

  • MOCVD

  • MODFET

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