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Surface finish and optical quality of CaF2 for UV-lithography applications

: Duparre, A.; Tielsch, R.; Kaiser, N.; Jakobs, S.; Mann, K.; Eva, E.


Hove, L. van den ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical microlithography XI
Bellingham, Wash.: SPIE, 1998 (SPIE Proceedings Series 3334)
ISBN: 0-8194-2779-9
Optical Microlithography Conference <11, 1998, Santa Clara/Calif.>
Conference Paper
Fraunhofer IOF ()
calciumfluoride; optical property; surface roughness; thin film coating; UV-Lithographie

CaF2 has received increasing attention as a promising substrate for coatings in the VUV range. Optimization of the optical properties of these optical components requires the study of basic characteristics of the coated and uncoated CaF2 substrates such as surface roughness, optical performance, absorption and scatter losses, and laser induced damage threshold. The investigations reveal the influence of different substrate polishing grades on the quality of the coated components.