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Subhalf micron critical dimension control in X-ray lithography mask technology
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1988
Conference Paper
Titel
Subhalf micron critical dimension control in X-ray lithography mask technology
Author(s)
Mescheder, U.
Mund, F.
Trube, J.
Windbracke, W.
Huber, H.-L.
Pongratz, S.
Hauptwerk
32nd International Symposium on Electron, Ion and Photon Beams '88. Proceedings
Konferenz
International Symposium on Electron, Ion and Photon Beams 1988
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT