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A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the SOLID lithography simulator

 

Microelectronic engineering 14 (1991), pp.283-297
ISSN: 0167-9317
English
Journal Article
Fraunhofer ISIT ()

: http://publica.fraunhofer.de/documents/PX-35244.html