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Statistical accuracy and CPU-time characteristic of three trajectory split methods for Monte-Carlo simulation of ion implantation

 

Ryssel, H.; Pichler, P.:
6th International Conference on Simulation of Semiconductor Devices and Processes. SISDEP '95. Proceedings
Wien: Springer, 1995 (Simulation of semiconductor devices and processes 6)
ISBN: 3-211-82736-6
pp.488
International Conference on Simulation of Semiconductor Devices and Processes (SISDEP) <6, 1995, Erlangen>
English
Conference Paper
Fraunhofer IIS B ( IISB) ()

: http://publica.fraunhofer.de/documents/PX-34737.html