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Spektroskopische Untersuchungen von Plasmaprozeßen bei gepulstem Laser- und Bogenabtrag

Spectroscopic investigations of plasma processes in PVD and arc
: Witke, T.; Siemroth, P.; Lenk, A.; Schülke, T.

Hecht, G. ; Societe Francaise du Vide -SFV-, Paris; Deutsche Vakuum-Gesellschaft:
Thin Films. Proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films HVITF '94
Oberursel: DGM-Informationsgesellschaft, 1994
ISBN: 3-88355-199-6
International Symposium on Trends and New Applications in Thin Films (TATF) <4, 1994, Dresden>
Conference on High Vacuum, Interfaces and Thin Films (HVITF) <11, 1994, Dresden>
Conference Paper
Fraunhofer IWS ()
aluminium; carbon; degree of ionisation; Ionisationsgrad; Kohlenstoff; laser; plasma temperature; Plasmatemperatur; spectroscopic investigation; spektroskopische Untersuchung; vacuum arc; Vakuumbogen

To improve the quality of Folms deposited by laser and vacuum arc evaporation processes, it is necessary to know the plasma condition as an important parameter. Focussed laser beams and vacuum arcs can produce power densities of 10 (exp 7) to 10 (exp 10) W/cm (exp 2). In this range the plasma is highly ionised. The density of the different ionic states and their kinetic energy influence the film-growth. Moreover the coupling of laser with wavelength more than 1 Micrometer to metallic targets can be improved by production of electrical charges on the target surface. Also for this problem optimum plasma properties must be determined. The plasma conditions are decided by the course of the plasma formation and the laser-plasma interaction within very short times and local inhomogeneous. The investigation of these plasma processes require a system for spectroscopic measurements with temporal and local resolution in the range of nanoseconds and micrometres. Therefore a spectrometer was equip ped at the input with a long distance microscop and at the outlet with a photomultiplier or a ccd-camera optionally with mcp-intensifier. Using this system it is possible to receive a spectral analysis with a microscopical resolution of about 5 micrometer, nanosecond time resolution and high optical sensitivity. In the present paper first results are reported of the program of plasma spectroscopic investigations.