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AFM and light scattering measurements of optical thin films for applications in the UV spectral region

 
: Jakobs, S.; Duparre, A.; Truckenbrodt, H.

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International Journal of Machine Tools and Manufacture 38 (1998), No.5/6, pp.733-739
ISSN: 0890-6955
English
Journal Article
Fraunhofer IOF ()
atomic force microscope; Dünne optische Schicht; Lichtstreuung; light scattering; Oberflächenrauheit; optical thin films; Rasterkraftmikroskopie; surface roughness

Abstract
Combination of atomic force microscopy and scattering measurements allows controlling the microstructure of substrates and optical thin films in the nanometer scale and of surface homogeneity over large areas. Results are presented of measurements on superpolished and conventionally polished substrates as well as on thin film fluoride coatings, demonstrating the capabilities of these measurement techniques.

: http://publica.fraunhofer.de/documents/PX-3423.html