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  4. Soft x-ray radiation from laser-produced plasmas - characterization of radiation emission and its use in x-ray lithography
 
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1988
Journal Article
Title

Soft x-ray radiation from laser-produced plasmas - characterization of radiation emission and its use in x-ray lithography

Abstract
Laser pulses of 15 ns and less than 3 J at 1064 nm and less than 1.2 J at 532 nm were focused onto steel targets to produce plasmas emitting intense soft x-ray radiation pulses. The plasma generation is described, and the x-ray emission is spectrally and spatially characterized. Using this plasma as an x-ray source, FBM 120 resist was exposed through a gold patterned 2-mym silicon mask. Exposing the same resist to a primary standard source (electron storage ring BESSY) the plasma x-ray emission was evaluated resulting in conversion efficiencies (laser into x-ray radiation) of up to 3.4% for 1064 nm and up to 5.0% for 532-nm laser radiation pulses. (IMT)
Author(s)
Kühne, M.
Petzold, H.-C.
Journal
Applied optics  
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Keyword(s)
  • laserproduced plasma

  • X-ray lithography

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