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  4. Small spot ESCA and scanning XPS investigations compared to scanning auger microanalysis.
 
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1988
Journal Article
Title

Small spot ESCA and scanning XPS investigations compared to scanning auger microanalysis.

Other Title
Small spot ESCA und scanning XPS Untersuchungen im Vergleich zur Scanning Auger Mikroanalyse
Abstract
Small spot ESCA with an Al K(alpha) X-ray source and a focussing monochromator has reached a spatial resolution of 150 mym. First experiments with illumination by synchrotron radiation without additional zone plate demagnification give the same spotsize but a 10 fold intensity. Experiments with Scanning XPS by moving an electron beam over the backside of a 2 mym thick Si membrane have shown the same count rates of photoelectrons as with an Al K(alpha) source but in a spot of only 4 mym. Scanning Auger microscopy gives a resolution of 50 nm for Si-Ta lines without topography and a resolution of 200 nm for a 1 mym high Au-step on a Si substrate at 10 keV primary electron energy. (IMT)
Author(s)
Brünger, W.H.
Journal
Beiträge zur elektronenmikroskopischen Direktabbildung von Oberflächen : BEDO  
Language
English
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Keyword(s)
  • high resolution XPS

  • surface analysis

  • X-ray lithography

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