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  4. Simulation of the lithographic properties of ion-beam resists
 
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1983
Book Article
Title

Simulation of the lithographic properties of ion-beam resists

Author(s)
Haberger, K.
Hoffmann, K.
Forster, M.
Ryssel, H.
Mainwork
Ion implantation. Equipment and techniques  
Language
English
IFT  
Keyword(s)
  • Ionenstrahl

  • Lithographie

  • Photolack

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