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Simulation of the lithographic properties of ion-beam resists
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1983
Book Article
Title
Simulation of the lithographic properties of ion-beam resists
Author(s)
Haberger, K.
Hoffmann, K.
Forster, M.
Ryssel, H.
Mainwork
Ion implantation. Equipment and techniques
Language
English
IFT
Keyword(s)
Ionenstrahl
Lithographie
Photolack
