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1993
Conference Paper
Titel
Simulation of sputter deposition process by DUPSIM
Abstract
A new deposition simulator is presented that allows modeling of sputter deposition processes. Various materials as well as several types of ring shaped magnetron sources can be considered. Some applications are presented to demonstrate the possibilities of the new program. It is part of the two-dimensional process simulator DUPSIM, which is able to simulate many fabrication processes of semiconductor devices in integrated circuits. Thereby a great flexibility and ease of use is reached.
Language
English