Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Simulation of silicon semiconductor processing
| European Transaction on Telecommunications and Related Technologies 1 (1990), No.3, pp.293-299 : Abb.,Lit.
ISSN: 1120-3862 |
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| English |
| Journal Article |
| Fraunhofer IIS B ( IISB) () |
| Prozeßsimulation |
Abstract
In VLSI development process simulation is needed to understand the interaction between successive process steps and to give input data for device simulation. The goal of this paper is to sketch the present state of process simulation and to give the reader a feeling of the difficulties but also of what can be gained by using such tools. Due to their importance, most attention will be given to the simulation of ion implantation, diffusion, and oxidation.