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Simulation assisted design of processes for gray-tone lithography

 

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Microelectronic engineering 27 (1995), pp.267-270
ISSN: 0167-9317
International Conference on Micro- and Nano-Engineering <1994, Davos>
English
Conference Paper
Fraunhofer ISIT ()

: http://publica.fraunhofer.de/documents/PX-33607.html