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Simulation assisted design of processes for gray-tone lithography
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1995
Journal Article
Titel
Simulation assisted design of processes for gray-tone lithography
Author(s)
Henke, W.
Hoppe, W.
Staudt-Fischbach, P.
Wagner, B.
Quenzer, H.J.
Zeitschrift
Microelectronic engineering
Konferenz
International Conference on Micro- and Nano-Engineering 1994
DOI
10.1016/0167-9317(94)00104-3
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT