SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 2

In this paper it is shown that low dose SIMOX is an efficient etch-stop to fabricate silicon membranes with well defined thickness. Due to the very high selectivity of TMAH as etch solution a four times lower oxygen dose than for standard SIMOX production is sufficient to form a good etch stop layer. This technique allows for a simple and very cost effective batch process production in addition into a large improvement of the silicon film quality.