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Scatter investigation of UV-films. Facing the trend towards shorter wavelength

 
: Duparre, A.; Kaiser, N.

Optical Society of America -OSA-, Washington/D.C.:
OSA Conference on Optical Interference Coatings 1998
Washington, DC: OSA, 1998 (OSA Technical digest series 1998,9)
ISBN: 1-55752-521-8
pp.346-347 : Ill.
Conference on Optical Interference Coatings <1998, Tucson/Ariz.>
English
Conference Paper
Fraunhofer IOF ()
AFM; atomic force microscope; light scattering; optical thin films; surface characterization

Abstract
General categories of coatings are defied in terms of the particular influence of the substrate and intrinsic film roughness on the overall scattering of the thin film component and are experimentally applied to UV-coatings. We discuss the problems and possibilities of scatter measurements at 248 nm and 193 nm in comparison to well established methods at higher wavelength and report on our achievements of Total Integrated Scatter measurements. The examples of investigations at 248 nm and 193 nm span a wide range of samples including fused silica and calciumfluoride substrates, single layer fluoride and oxide coatings and multilayer mirrors.

: http://publica.fraunhofer.de/documents/PX-32407.html