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Scale-up of pulsed laser deposition -PLD- for 4-wafer coating

Vortrag Symposium F, COLA '95.
Aufskalierung der PLD für 4-wafer-Beschichtung
: Panzner, M.; Dietsch, R.; Holz, T.; Mai, H.; Völlmar, S.


Applied surface science 96/98 (1995), pp.643-648
ISSN: 0169-4332
European Materials Research Society (Spring Meeting) <1995, Strasbourg>
Conference Paper
Fraunhofer IWS ()
PLD; nm-Präzisionsschicht; Laser-Verfahren; Laserchemie; Multischicht; Nanomaterialien; Grenzfläche

PLD of uniform thin films on 4-wafers has been realized by the integration of a PLD-source into a commercial MBE-system. Thickness homogeneity over the total substrate area is obtained by precise spatial control of the plasma plumes excited simultaneously at two or more adjacent target locations. Computer controlled motion of a cylindrical target with respect to the stationary focal spots of the laser beams, has to provide (a) a suitable deflection of the plume axis and (b) a uniform target erosion. Process control was investigated by computer simulations. The efficiency of the two techniques for large-area coating described in this paper is illustrated by the preparation of DLC thin film specimens and their ellipsometric characterization. Special film thickness gradients were realized by a particular regime of target and substrate motion.