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Roughness analysis of optical films and substrates by atomic force microscopy

: Duparre, A.; Ruppe, C.

Thin solid films 288 (1996), pp.8-13
ISSN: 0040-6090
Journal Article
Fraunhofer IOF ()
atomic force microscopy; Dünne optische Schicht; Lichtstreuung; light scattering; Oberflächenrauheit; optical thin films; Rasterkraftmikroskopie; surface roughness

From atomic force microscopy (AFM) topographic data, the power spectral densities (PSDs) of substrate and film surfaces were calculated over extended bandwidths. The results were successfully compared with PSDs obtained from angle-resolved scattering (ARS) measurements, while considering the overlapping spectral frequency range of both methods. The PSD curves obtained by AFM also proved to be a suitable tool for investigating the influence of the substrate on the surface topography of thin film coatings. A correlation factor quantifying the relation between the substrate and film PSDs suggest as a measure of substrate replication effects after thin film deposition.