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Repetitive plasma focus as radiation source for X-ray lithography.

Wiederholbarkeit des Plasmafokusses als Strahlenquelle für die Röntgen-Lithographie
: Richter, F.; Eberle, J.; Holz, R.; Neff, W.; Lebert, R.

Pereira, N.R. ; American Institute of Physics -AIP-, New York:
Dense z-pinches. Second International Conference 1989
New York/N.Y.: AIP, 1989 (AIP Conference Proceedings 195)
ISBN: 0-88318-396-X
International Conference on Dense Z-Pinches <2, 1989, Laguna Beach/Calif.>
Conference Paper
Fraunhofer ILT ()
Abstufung; capacitor bank; compatible; cylindrical insulator; electron storage ring; Elektronenlagerring; Isolator; kompatibel; Kondensator-Bank; Röntgenlithographie; Röntgenstrahl; X-ray lithography; x-ray stepper; zylindrig

Plasma focus devices employing gases Z > 2 are capable to produce a small volume of plasma, less than 1 mm in diameter, with electron density n sub e about 10 high 20 cm high -3 and mean participle energy of about 1 keV. The dominant radiation of neon plasma is in the wavelength region between 0.7 nm and 1.2 nm, which is appropriate for x-ray lithography. A 4 kJ plasma focus has been developed and investigated as a source for x-ray lithography for industrial applications. Using proximity printing with a proximity distance of 40 My m and a source-mask distance of 400 mm, a resolution to less than 0.3 My m has been achieved. Working with a repetition rate of several pulses per second a 30 mJ/square centimeter sensitivity resist requires exposure time of 5 minutes.