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Repair of clear defects on X-ray masks by ion-induced metal deposition

 
: Petzold, H.-C.; Burghause, H.; Putzar, R.; Weigmann, U.; Economou, N.P.; Stern, L.A.

Yanof, A.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Electron-beam x-ray and ion-beam technlogy. Submicrometer lithographies VIII : 1-3 March 1989, San Jose, California
Bellingham, Wash.: SPIE, 1989 (Proceedings of SPIE 1089)
ISBN: 0-8194-0124-2
Society of Photo-Optical Instrumentation Engineers (Conference) <1989, San Jose/Calif.>
English
Conference Paper
Fraunhofer ISIT ()
focussed ion beam; mask repair; X-ray lithography

Abstract
To investigate the repair of clear defects on X-ray masks by ion-induced metal deposition, a photomask repair system was modified to allow for the localized deposition of tungsten from a gas jet of W(CO) sub 6 vapor. With this system, dense W layers could be deposited at rates of up to 4 nm/s; the X-ray opacity of layers having a thicknes of down to 200 nm was demonstrated by Y-ray lithographic resist exposures using synchrotron radiation.

: http://publica.fraunhofer.de/documents/PX-31738.html