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1999
Conference Paper
Title
Reliability of passivated 0.15 mu m InAlAs/InGaAs HEMT's with pseudomorphic channel
Other Title
Zuverlässigkeit von passivierten 0.15 mu m InAlAs/InGaAs HEMTs mit pseudomorphem Kanal
Abstract
Accelerated life tests of 0. 15 mu m gate length InAlAs/InGaAs HEMTs were performed under DC electrical stress at four temperatures in nitrogen. By defining a 100 per cent-degradation of transconductance as failure criterion we found an activation energy of 1.8 eV and a projected life time of 5x10(exp 6) h at 125 degree ambient temperature. The degradation was found to be much faster in air than in nitrogen. High temperature storage tests showed that our devices are not sensitive to hydrogen.
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